JPH021386B2 - - Google Patents
Info
- Publication number
- JPH021386B2 JPH021386B2 JP58004456A JP445683A JPH021386B2 JP H021386 B2 JPH021386 B2 JP H021386B2 JP 58004456 A JP58004456 A JP 58004456A JP 445683 A JP445683 A JP 445683A JP H021386 B2 JPH021386 B2 JP H021386B2
- Authority
- JP
- Japan
- Prior art keywords
- layer
- cladding layer
- optical waveguide
- conductivity type
- cladding
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D30/00—Field-effect transistors [FET]
- H10D30/60—Insulated-gate field-effect transistors [IGFET]
Landscapes
- Semiconductor Lasers (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP58004456A JPS59129473A (ja) | 1983-01-14 | 1983-01-14 | 半導体レーザ装置の製造方法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP58004456A JPS59129473A (ja) | 1983-01-14 | 1983-01-14 | 半導体レーザ装置の製造方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS59129473A JPS59129473A (ja) | 1984-07-25 |
JPH021386B2 true JPH021386B2 (en]) | 1990-01-11 |
Family
ID=11584648
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP58004456A Granted JPS59129473A (ja) | 1983-01-14 | 1983-01-14 | 半導体レーザ装置の製造方法 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS59129473A (en]) |
Families Citing this family (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0766992B2 (ja) * | 1984-12-21 | 1995-07-19 | ソニー株式会社 | AlGaInP系半導体レーザとその製造方法 |
JP2525776B2 (ja) * | 1986-07-15 | 1996-08-21 | 株式会社東芝 | 半導体装置の製造方法 |
US5119388A (en) * | 1989-02-24 | 1992-06-02 | Laser Photonics, Inc. | Low tuning rate PbTe/PbEuSeTe buried quantum well tunable diode lasers and arrays |
US5028563A (en) * | 1989-02-24 | 1991-07-02 | Laser Photonics, Inc. | Method for making low tuning rate single mode PbTe/PbEuSeTe buried heterostructure tunable diode lasers and arrays |
JP2586826B2 (ja) * | 1994-06-21 | 1997-03-05 | ソニー株式会社 | AlGaInP系半導体レーザとその製法 |
US6567443B2 (en) * | 1999-09-29 | 2003-05-20 | Xerox Corporation | Structure and method for self-aligned, index-guided, buried heterostructure AlGalnN laser diodes |
JP2006005167A (ja) * | 2004-06-17 | 2006-01-05 | Sumitomo Electric Ind Ltd | 半導体光素子 |
JP4461980B2 (ja) | 2004-09-22 | 2010-05-12 | 住友電気工業株式会社 | 半導体光素子 |
JP4424223B2 (ja) | 2005-03-01 | 2010-03-03 | 住友電気工業株式会社 | 半導体光素子 |
JP5463760B2 (ja) | 2009-07-02 | 2014-04-09 | 三菱電機株式会社 | 光導波路集積型半導体光素子およびその製造方法 |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS51142283A (en) * | 1975-06-02 | 1976-12-07 | Nippon Telegr & Teleph Corp <Ntt> | Light emitting diode |
JPS526093A (en) * | 1975-07-04 | 1977-01-18 | Hitachi Ltd | Production method of semiconductor device |
-
1983
- 1983-01-14 JP JP58004456A patent/JPS59129473A/ja active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS59129473A (ja) | 1984-07-25 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JPH021387B2 (en]) | ||
US4270096A (en) | Semiconductor laser device | |
JPS6180882A (ja) | 半導体レ−ザ装置 | |
JPH021386B2 (en]) | ||
JP3982985B2 (ja) | 半導体レーザ素子の製造方法 | |
US4783425A (en) | Fabrication process of semiconductor lasers | |
JPS61168981A (ja) | 半導体レ−ザ装置 | |
JP2001077465A (ja) | 半導体レーザ及びその製造方法 | |
JPS6349396B2 (en]) | ||
JPH05206565A (ja) | 半導体レーザ素子 | |
US5362675A (en) | Manufacturing method of laser diode and laser diode array | |
JPH07283482A (ja) | 半導体レーザ装置及びその作製方法 | |
JP2000138414A (ja) | 面発光レーザアレイの製造方法 | |
JP2751356B2 (ja) | 半導体レーザの製造方法 | |
JPH0567839A (ja) | 半導体レーザ装置 | |
JPS5834988A (ja) | 半導体レ−ザの製造方法 | |
JPS6237835B2 (en]) | ||
JPH08274413A (ja) | 半導体デバイス及びその製造方法 | |
JPH0430758B2 (en]) | ||
JPS61187388A (ja) | 半導体レ−ザの製造方法 | |
JPH04159787A (ja) | ガリウム・インジウム・ヒ素活性層半導体レーザ素子 | |
JPH0559594B2 (en]) | ||
JPH0370391B2 (en]) | ||
JPH0546116B2 (en]) | ||
JPH0724320B2 (ja) | 半導体レーザおよびその製造方法 |